Xe (5N)
- ≥ 99.999% (5N)
- 0.44~49L
- 50L~10000L
Chemical name : Xenon
Chemical formula : Xe (SDS)
CAS.NO: 7440-63-3
MW : 131 g/mol
Vapor pressure : 1.013 bar@-108℃
Melting point : -112 ℃
Boiling point : -108 ℃
Xenon (Xe) plays an important role in the semiconductor industry, particularly in plasma etching, ion implantation, photolithography, and surface cleaning processes. Its inert nature and ability to form ionized states make it suitable for precision etching and implantation processes. Additionally, Xenon lamps provide the light source for advanced photolithography, which is essential for producing smaller, more precise semiconductor devices. The use of Xenon in semiconductor manufacturing enhances the efficiency and quality of fabrication processes, contributing to the advancement of modern integrated circuits.