CO2 (4N、5N)

Purity
  • ≥ 99.99% (4N)、99.999% (5N)
Package
  • 47L、50L
Net weight
  • 20KG、25KG
Product details

Chemical name : Carbon Dioxide
Chemical formula : CO2 (SDS)
CAS.NO： 124-38-9
MW : 44  g/mol
Vapor pressure : 57.3 bar@20℃
Melting point : -56.6 ℃ 
Boiling point : -78.5 ℃

Semiconductor applications

While Carbon Dioxide (CO2) is not as commonly used as other gases in semiconductor manufacturing, it plays a crucial role in certain processes such as laser etching, chemical vapor deposition (CVD), supercritical cleaning, and material processing. CO2 lasers are utilized for high-precision material removal, while supercritical CO2 cleaning provides an effective, eco-friendly method to remove contaminants from semiconductor wafers. Additionally, CO2's environmental benefits make it an attractive gas for specialized semiconductor applications.

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