CF3I (4N)

Purity
  • ≥ 99.99% (4N)
Package
  • 47L
Net weight
  • 70KG
Product details

Chemical name : Trifluoroiodomethane 
Chemical formula : CF3I (SDS)
CAS.NO： 2314-97-8
MW : 195.91 g/mol
Vapor pressure : 4.72 bar@20℃
Melting point : -110 ℃ 
Boiling point : -22.5 ℃

Semiconductor applications

CF3I (Trifluoroiodomethane) is an important gas in semiconductor manufacturing, especially in plasma etching, chemical vapor deposition (CVD), surface modification, and fluorination reactions. Its fluorine content allows it to effectively etch and deposit fluorine-based thin films, which are crucial for insulating and protecting semiconductor devices. With high selectivity, low damage, and excellent performance in advanced semiconductor nodes, CF3I is an essential gas for high-precision processes such as etching, deposition, and surface treatment in the semiconductor industry.

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