C4H2F6 (4N)

Purity
  • ≥ 99.99% (4N)
Package
  • 47L
Net weight
  • 50KG
Product details

Chemical name : (E)-1,1,1,4,4,4-Hexafluoro-2-Butene
Chemical formula : C4H2F6 (SDS)
CAS.NO： 66711-86-2 
MW : 164.05 g/mol
Vapor pressure : 1.6 bar@20℃
Melting point : <-20 ℃ 
Boiling point : 7.5 ℃

Semiconductor applications

Trans-1,1,1,4,4,4-Hexafluoro-2-butene (C₄H₂F₆) is primarily used in semiconductor processes such as etching, chemical vapor deposition (CVD), thin film deposition, and as a fluorine source. Its fluorine characteristics and stable chemical behavior make it crucial in processes, particularly in the fabrication of low-k dielectric materials, fluorine-based thin films, and precise etching steps. As semiconductor technology advances, these fluorine compounds will play an increasingly important role in the production of high-performance chips and microelectronic devices.

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