CH2F2 (5N)

Purity
  • ≥ 99.999% (5N)
Package
  • 47L
Net weight
  • 30KG
Product details

Chemical name : Difluoromethane
Chemical formula : CH2F2 (SDS)
CAS.NO： 75-10-5 
MW :  52 g/mol
Vapor pressure : 13.8 bar@20℃
Melting  point :-136℃ 
Boiling point : -51.7 ℃

Semiconductor applications

CH2F2 (Difluoromethane) is an important gas in semiconductor manufacturing, primarily used for plasma etching, chemical vapor deposition, surface treatment, and gas mixtures. It plays a key role in etching fluorinated materials, metals, and dielectric layers, as well as in the deposition of fluorine-containing thin films. With its high etching selectivity, low contamination, and ability to form fluorine-based films, CH2F2 is a valuable gas source in modern semiconductor processes.

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