C4F8 (5N)

Purity
  • ≥ 99.999% (5N)
Package
  • 47L
Net weight
  • 50KG
Product details

Chemical name : Octafluorocyclobutane
Chemical formula : C4F8 (SDS)
CAS.NO： 115-25-3
MW : 200 g/mol
Vapor pressure : 2.7 bar@20℃
Melting point : -40.2 ℃ 
Boiling point : -6.4 ℃

Semiconductor applications

C4F8 (Octafluorocyclobutane) plays a significant role in semiconductor manufacturing, particularly in plasma etching and CVD processes. It is used for etching metals, dielectrics, and hard masks, as well as for depositing fluorinated thin films that provide insulation and protection. C4F8's high selectivity, precision, and ability to deposit fluorine-based films make it an essential gas in the production of advanced semiconductor devices, particularly at smaller process nodes.

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