CHF3 (5N)

Purity
  • ≥ 99.999% (5N)
Package
  • 47L
Net weight
  • 32KG
Product details

Chemical name : Trifluoromethane
Chemical formula : CHF3 (SDS)
CAS.NO： 75-46-7 
MW : 70 g/mol
Vapor pressure : 47.4 bar@25℃
Melting point : -155.18 ℃ 
Boiling point : -82.16 ℃

Semiconductor applications

CHF3 (Trifluoromethane) is an important gas in semiconductor manufacturing, particularly for plasma etching, chemical vapor deposition, and advanced processing techniques. It is used to etch dielectric layers, metals, and low-k materials, as well as to deposit fluorine-based thin films for insulation and protection. Its ability to provide high selectivity, low contamination, and precision makes it invaluable in the production of modern semiconductor devices, especially at advanced nodes.

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